Investigation of Metal Oxide Thin Films and Nanofibers by Electron Emission Spectroscopy
- Abstract
- In this thesis, the results of surface characteristics of CuOx, MoOxNy, MoSx, and various metal oxide thin films investigated with electron emission spectroscopy (EES) were reported. In order to study of the surface properties of the thin films, EES and sputter chambers were built and modified. The EES chamber was equipped with X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and ultraviolet photoelectron spectroscopy (UPS). The oxidation state of the elements on the films was determined after peak deconvolution process. We verified that the ratio of chemical species with different oxidation states is one of crucial factors of the characteristics of the films.
- Issued Date
- 2015
- Awarded Date
- 2015. 2
- Type
- Dissertation
- Publisher
- 부경대학교
- Affiliation
- 부경대학교
- Department
- 대학원 화학과
- Advisor
- 강용철
- Table Of Contents
- LIST OF FIGURES...........................................................................................vi
LIST OF TABLES...........................................................................................xiii
ABSTRACT....................................................................................................xiv
CHAPTER
I. Introduction..............................................................................................1
1.1 Material System..............................................................................1
1.2 Electron Emission Spectroscopy System........................................5
1.2.1 Analysis Chamber..................................................................7
1.2.2 Sample Preparation Chamber................................................9
1.2.3 rf Sputter Chamber...............................................................11
II. Theories..................................................................................................18
2.1 X-ray Photoelectron Spectroscopy (XPS)......................................18
2.2 Auger Electron Spectroscopy (AES).............................................29
2.3 Ultraviolet Photoelectron Spectroscopy (UPS).............................35
III. Copper Oxide Thin Films....................................................................38
3.1 Introduction...................................................................................38
3.2 Effect of rf Power and Oxygen Gas Ratio.....................................40
3.2.1 Experimental........................................................................40
3.2.2 Results and Discussion........................................................41
3.2.3 Conclusion...........................................................................54
3.3 Effect of Substrate Temperature....................................................56
3.3.1 Experimental........................................................................56
3.3.2 Results and Discussion........................................................57
3.3.3 Conclusion...........................................................................78
IV. Molybdenum Oxynitride Thin Films...................................................79
4.1 Introduction...................................................................................79
4.2 Experimental.................................................................................81
4.3 Results and Discussion..................................................................83
4.4 Conclusion.....................................................................................98
V. Molybdenum Sulfide Thin Films..........................................................99
5.1 Introduction...................................................................................99
5.2 Experimental...............................................................................101
5.3 Results and Discussion...............................................................104
5.4 Conclusion...................................................................................116
VI. Copper Oxide Nanofibers..................................................................117
6.1 Introduction.................................................................................117
6.2 Experimental...............................................................................120
6.3 Results and Discussion................................................................122
6.4 Conclusion...................................................................................132
VII. Investigation of Metal Oxide Thin Films Using Electron Emission Spectroscopy.....................................................................................133
7.1 HfAlO3 Dielectric Thin Films.....................................................133
7.1.1 Introduction.......................................................................133
7.1.2 Experimental......................................................................134
7.1.3 Results and Discussion......................................................137
7.1.4 Conclusion.........................................................................143
7.2 Ga-Zn-Sn-O Thin Films..............................................................144
7.2.1 Introduction.......................................................................144
7.2.2 Experimental......................................................................145
7.2.3 Results and Discussion......................................................147
7.2.3.1 Effect of Ga Concentration...................................147
7.2.3.2 Effect of Post-Annealing......................................154
7.2.4 Conclusion.........................................................................159
7.3 SnO2:F Films...............................................................................160
7.3.1 Introduction.......................................................................160
7.3.2 Experimental......................................................................161
7.3.3 Results and Discussion......................................................162
7.3.4 Conclusion.........................................................................167
7.4 PEDOT:PSS Films......................................................................168
7.4.1 Introduction.......................................................................168
7.4.2 Experimental......................................................................169
7.4.3 Results and Discussion......................................................171
7.4.3.1 Dynamic Etching..................................................171
7.4.3.2 Electric Field........................................................171
7.4.4 Conclusion.........................................................................177
7.5 Mo Oxide Thin Films..................................................................178
7.5.1 Introduction.......................................................................178
7.5.2 Experimental......................................................................179
7.5.3 Results and Discussion......................................................179
7.5.4 Conclusion.........................................................................184
7.6 Tungsten Oxide Films.................................................................185
7.6.1 Introduction.......................................................................185
7.6.2 Experimental......................................................................186
7.6.3 Results and Discussion......................................................186
7.6.4 Conclusion.........................................................................188
7.7 Ba3P4O13_Eu...............................................................................189
7.7.1 Introduction.......................................................................189
7.7.2 Experimental......................................................................189
7.7.3 Results and Discussion......................................................190
7.7.4 Conclusion.........................................................................195
7.8 Zn Oxide Thin Films...................................................................196
7.8.1 Introduction.......................................................................196
7.8.2 Experimental......................................................................196
7.8.3 Results and Discussion......................................................198
7.8.4 Conclusion.........................................................................203
REFERENCES...............................................................................................204
APPENDICES................................................................................................223
A: Procedure for Baking the EES Chamber.............................................223
B: Procedure for Degassing the Equipment.............................................225
C: Procedure for Loading and Unloading Samples.................................233
D: Procedure for XPS..............................................................................236
E: Procedure for AES...............................................................................241
F: Procedure for UPS...............................................................................243
G: Procedure for Electron Flood Gun......................................................246
H: Procedure for Ar Ion Sputtering..........................................................247
I: Procedure for Depth Profile.................................................................249
J: Procedure for Quadrupole Mass Spectrometer (QMS).......................250
K: Procedure for rf Sputtering in UHV....................................................251
L: Procedure for rf co-Sputtering............................................................252
M: Procedure for Kelvin Probe (KP).......................................................256
N: Procedure for Alpha Step...................................................................259
O: Procedure for 4-Point Probe...............................................................262
P: Procedure for Measurement of Contact Angle...................................264
Q: Procedure for Measurement of Viscosity............................................265
R: Procedure for Electrospinning............................................................267
S: Procedure for Furnace.........................................................................269
T: XPS Line Positions Obtained from Mg X-rays...................................271
U: XPS Line Positions Obtained from Al X-rays....................................276
V: Atomic Sensitivity Factors for XPS....................................................281
KOREAN ABSTRACT..................................................................................297
- Degree
- Doctor
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