A new UHV system construction and the surface chemistry of D₂O/Zircaloy-4
- Alternative Title
- 새로운 UHV 시스템 제작과 D₂O/Zircaloy-4의 표면 화학
- Abstract
- Chapter 1에서 초고진공 (UHV) 시스템은 지르칼로이-4 (Zircaloy-4) 의 표면 화학 연구를 위해 디자인되고 제작되었다. 초고진공은 roughing pump (RP), turbomolecular pump (TMP), titanium sublimation pump (TSP) 그리고 두개의 ion pumps (IP)에 의해 만들어졌다. 초고진공 챔버는 Auger electron spectroscopy (AES), low-energy electron diffraction (LEED)가 장착 되어 있고 temperature programed desorption (TPD) 실험을 위해 quadruple mass spectrometer (QMS)가 부착되었으며 gas handling system이 설치되었다. 또한 샘플 cleaning을 위해 argon ion gun이 부착되어 있다.
Chapter 2에서는 중수(D2O)를 흡착시킨 지르칼로이-4(Zircaloy-4)를 아르곤 이온 스퍼터링(Ar-ion bombardment)과 가열(annealing)을 한 후에 그 표면현상을 XPS (X-ray photoelectron spectroscopy)와 UPS (Ultraviolet photoelectron spectroscopy)로 연구했다. XPS 연구 결과에서, 아르곤 이온 스퍼터링과 열에 의한 영향이 분명하게 관찰 되었다. 아르곤 스퍼터링은 지르칼로이-4의 표면 위에 있는 산소를 점점 고갈시켰으며 열 또한 표면의 산소를 제거하는 원인이 되었다. 그것은 지르코늄의 산화상태가 낮은 상태로의 변화를 이끌었다. UPS 연구는 아르곤 이온 스퍼터링 후에 산소가 사라지면서 약 13 eV 부근의 주된 픽과 약 9 eV의 픽이 감소되고 페르미 레벨에서 metallic Zr 4d 상태의 새로운 픽의 발전을 이끈 것을 보여준다.
A new ultra-high vacuum (UHV) system was designed and constructed for the studies of Zircaloy-4 surface chemistry. Ultra-high vacuum was achieved by a roughing pump (RP), a turbomolecular pump (TMP), a titanium sublimation pump (TSP) and two ion pumps (IP). The UHV chamber was equipped with Auger electron spectroscopy (AES), low-energy electron diffraction (LEED), a quadruple mass spectrometer (QMS), a gas handling system for temperature programed desorption (TPD) and an argon ion gun for sample cleaning.
The surface chemistry of D2O dosed Zircaloy-4 surface followed by Ar-ion bombardment and annealing was studied by means of X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). In XPS study, the effects of the Ar+ bombardment and annealing were clearly observed. The Ar+ sputtering led to the gradual depletion of oxygen on the surface region and the annealing caused to remove the oxygen on the surface of Zircaloy-4. The decrease of oxygen on the surface region resulted in the change of oxidation states of zirconium from zirconium oxides to metallic zirconium. UPS study showed the dominant peak at around 13 eV and the peak at around 9 eV decreased, but the peak of the metallic Zr 4d state at the Fermi level developed as the oxygen vanished after stepwise Ar+ fluences.
- Author(s)
- 오경선
- Issued Date
- 2007
- Awarded Date
- 2007. 8
- Type
- Dissertation
- Keyword
- ultra-high vaccum (UHV) Zircaloy-4 D2O X-ray photoelectron spectroscopy UV photoelectron spectroscopy Ar-ion sputtering annealing oxidation
- Publisher
- 부경대학교 대학원
- URI
- https://repository.pknu.ac.kr:8443/handle/2021.oak/3716
http://pknu.dcollection.net/jsp/common/DcLoOrgPer.jsp?sItemId=000001953648
- Alternative Author(s)
- Oh, Kyung-Sun
- Affiliation
- 부경대학교 대학원
- Department
- 대학원 화학과
- Advisor
- 강용철
- Table Of Contents
- Ⅰ. THEORIY = 1
1. X-ray Photoelectron Spectroscopy (XPS) = 1
2. Ultra-violet Photoelectron Spectroscopy (UPS) = 3
3. Temperature Programmed Desorption (TPD) = 3
4. Auger Electron Spectroscopy (AES) = 6
Ⅱ. CHAPTER 1. Newly designed ultra-high vacuum (UHV) system = 9
1. UHV chamber = 9
2. Gas handling system = 10
3. Sample manipulator = 11
Ⅲ. CHAPTER 2. The effects of Ar-ion bombardment and annealing of D₂O/Zircaloy-4 surfaces using XPS and UPS = 15
1. Introduction = 15
2. Experimental section = 16
2-1. Sample preparation = 16
2-2. UHV system = 17
2-3. XPS and UPS experimental details = 17
3. Results and Discussion = 20
3-1. The effect of Ar^(+) sputtering by using XPS = 20
3-2. The effect of annealing by using XPS = 27
3-3. The UPS results after Ar^(+) sputtering = 33
Ⅳ. CONCLUSION = 35
Ⅴ. REFERENCES = 36
Ⅵ. APPENDIX = 39
PROCEDURE FOR ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY = 39
KOREAN ABSTRACT = 42
ACKNOWLEDGMENT = 43
- Degree
- Master
-
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- 대학원 > 공업화학과
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