전자 분광학을 이용한 수산화암모늄과 지르칼로이-4의 표면 분석

Abstract

The interaction of Ammonium hydroxide (NH₄OH) with Zircaloy-4 (Zry-4) was investigated using X-ray Photoelectron Spectroscopy (XPS) and the surface cleanness was checked by Auger Electron Spectroscopy(AES). In order to study surface chemistry of NH₄OH/Zry-4 system, the binding energies of N 1s, O 1s and Zr 3d electrons were monitored. The N 1s peak intensity remarkably increased following cycles of argon ion sputtering after NH₄OH dosed onto Zry-4 surface at room temperature because the nitrogen stayed under the surface region was diffused out onto the Zry-4 surface. But, the surface oxygen was diffused into the bulk or desorbed out until Ar^(+) fluence was 6.0 x 10^(16) Ar^(+)/cm2. Therefore the O 1s peak intensity was decreased by stepwise Ar^(+) sputtering. After many cycles of Ar^(+) sputtering, the peak intensities of Zr 3d peaks were not changed but the shapes of the peaks were clearly changed. This implies that the oxidation state of zirconium is changed during Ar^(+) sputtering. The Zr 3d peak intensity of zirconium nitride (ZrN_(x)) increased as the intensity of N 1s (from zirconium nitride) increased but the Zr 3d peak intensity of zirconium oxide (ZrO_(x)) decreased due to depopulation of the hydroxyl ion. The Zr^(4+) intensity was nearly same after Ar^(+) sputtering processes but the peak intensity of metallic Zirconium increased compared to that of before the sputtering process because the surface was relatively clean.