Perfluorophenyl Azide 유도체의 SAM를 이용한 실리콘 웨이퍼 표면개질에 관한 연구

Abstract

We report a simple and effective method to photochemically attach thin polymeric layers to solid surface. A thin film of polymer was fabricated on functionalized silicon wafer through self-assembled monolayer (SAM) of perfluorophenyl azide derivatives (PFPA-silane). The SAMs were formed in supercritical carbon dioxide (scCO₂) and toluene. The results indicate that scCO₂ is a good solvent for silylation reactions, better than common organic solvent such as toluene. The immobilization of polymers is based on photoreactive azido groups of PFPA-silane which is bound to SiO₂ surface via silane anchor. As a result of the photochemical reaction, a thin layer of the polymer is covalently bound to the surface. Unbounded polymer is removed by sonication. As examples, we have successfully attached thin films of polystyrene and poly(2-ethyl-2-oxazoline). Furthermore, the combination of immobilization chemistry with photolithography, which generated patterned polymer films and hybrid arrays with unique surface topographies is also reported.